Invention Grant
- Patent Title: Method for manufacturing optical interferometer
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Application No.: US14911583Application Date: 2014-07-31
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Publication No.: US09618323B2Publication Date: 2017-04-11
- Inventor: Tomofumi Suzuki , Yoshihisa Warashina , Kohei Kasamori , Tatsuya Sugimoto , Jo Ito
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2013-169479 20130819
- International Application: PCT/JP2014/070219 WO 20140731
- International Announcement: WO2015/025691 WO 20150226
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01J3/02 ; G01J3/453

Abstract:
A method of manufacturing an optical interferometer includes a first step of forming a first semiconductor portion for a beam splitter and a second semiconductor portion for a movable mirror on a main surface of a support substrate and a first insulating layer formed on the main surface, a second step of disposing a first wall portion between a first side surface of the first semiconductor portion and a second side surface in the second semiconductor portion, and a third step of forming a mirror surface in the second semiconductor portion by forming a first metal film on the second side surface using a shadow mask. In the third step, the first side surface is masked by the mask portion and the first wall portion and the first metal film is formed in a state in which the second side portion is exposed from an opening portion.
Public/Granted literature
- US20160202037A1 METHOD FOR MANUFACTURING OPTICAL INTERFEROMETER Public/Granted day:2016-07-14
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