Invention Grant
- Patent Title: Three-dimensional electrostatic discharge semiconductor device
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Application No.: US14871181Application Date: 2015-09-30
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Publication No.: US09620587B2Publication Date: 2017-04-11
- Inventor: Jagar Singh , Andy Wei , Mahadeva Iyer Natarajan
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Heslin Rotherberg Farley & Mesiti P.C.
- Agent Wayne F. Reinke, Esq.
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/06 ; H01L21/306 ; H01L21/308 ; H01L29/417 ; H01L29/45 ; H01L29/861 ; H01L29/866

Abstract:
Three-dimensional electrostatic discharge (ESD) semiconductor devices are fabricated together with three-dimensional non-ESD semiconductor devices. For example, an ESD diode and FinFET are fabricated on the same bulk semiconductor substrate. A spacer merger technique is used in the ESD portion of a substrate to create double-width fins on which the ESD devices can be made larger to handle more current.
Public/Granted literature
- US20160020204A1 THREE-DIMENSIONAL ELECTROSTATIC DISCHARGE SEMICONDUCTOR DEVICE Public/Granted day:2016-01-21
Information query
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