• Patent Title: Talbot effect based nearfield diffraction for spectral filtering
  • Application No.: US14785644
    Application Date: 2014-11-12
  • Publication No.: US09640293B2
    Publication Date: 2017-05-02
  • Inventor: Ewald RoesslThomas Koehler
  • Applicant: KONINKLIJKE PHILIPS N.V.
  • Applicant Address: NL Eindhoven
  • Assignee: KONINKLIJKE PHILIPS N.V.
  • Current Assignee: KONINKLIJKE PHILIPS N.V.
  • Current Assignee Address: NL Eindhoven
  • Priority: EP13194809 20131128; EP14163668 20140407
  • International Application: PCT/EP2014/074321 WO 20141112
  • International Announcement: WO2015/078690 WO 20150604
  • Main IPC: G21K1/06
  • IPC: G21K1/06
Talbot effect based nearfield diffraction for spectral filtering
Abstract:
The invention relates to a grating arrangement and a method for spectral filtering of an X-ray beam (B), the grating arrangement comprising: a dispersive element (10) comprising a prism configured to diffract the X-ray beam (B) into a first beam component (BC1) comprising a first direction (D1) and a second beam component comprising (BC2) a second direction (D2), tilted with respect to the first direction; a first grating (20) configured to generate a first diffraction pattern (DP1) of the first beam component (BC1) and a second diffraction pattern (DP2) of the second beam component (BC2), the second diffraction pattern (DP2) shifted with respect to the first diffraction patter (DP1); and a second grating (30) comprising at least one opening (31) which is aligned along a line (d) from a maximum (MA) to a minimum (MI) of intensity of the first diffraction pattern (DP1) or of the second diffraction pattern (DP2).
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