Invention Grant
- Patent Title: Thermoset polymides for microelectronic applications
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Application No.: US14171707Application Date: 2014-02-03
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Publication No.: US09646903B2Publication Date: 2017-05-09
- Inventor: Stephen E. Lehman, Jr. , James C. Matayabas, Jr. , Saikumar Jayaraman
- Applicant: James C. Matayabas, Jr. , Saikumar Jayaraman
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: C08G73/10
- IPC: C08G73/10 ; C08L79/08 ; H01L23/24 ; H01L21/56 ; H01L23/00

Abstract:
Dendrimer/hyperbranched materials are combined with polyimide to form a low CTE material for use as a dielectric substrate layer or an underfill. In the alternative, ruthenium carbene complexes are used to catalyze ROMP cross-linking reactions in polyimides to produce a class of cross-linkable, thermal and mechanical stable material for use as a dielectric substrate or underfill. In another alternative, dendrimers/hyperbranched materials are synthesized by different methods to produce low viscosity, high Tg, fast curing, mechanically and chemically stable materials for imprinting applications.
Public/Granted literature
- US20140148557A1 THERMOSET POLYMIDES FOR MICROELECTRONIC APPLICATIONS Public/Granted day:2014-05-29
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