- 专利标题: Low voltage embedded memory having conductive oxide and electrode stacks
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申请号: US14950784申请日: 2015-11-24
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公开(公告)号: US09647208B2公开(公告)日: 2017-05-09
- 发明人: Elijah V. Karpov , Brian S. Doyle , Charles C. Kuo , Robert S. Chau , Eric R. Dickey , Michael Stephen Bowen , Sey-Shing Sun
- 申请人: Elijah V. Karpov , Brian S. Doyle , Charles C. Kuo , Robert S. Chau , Eric R. Dickey , Michael Stephen Bowen , Sey-Shing Sun
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Blakely, Sokoloff, Taylor & Zafman LLP
- 主分类号: G11C11/00
- IPC分类号: G11C11/00 ; H01L45/00 ; G11C13/00 ; H01L27/24
摘要:
Low voltage embedded memory having conductive oxide and electrode stacks is described. For example, a material layer stack for a memory element includes a first conductive electrode. A conductive oxide layer is disposed on the first conductive electrode. The conductive oxide layer has a plurality of oxygen vacancies therein. A second electrode is disposed on the conductive oxide layer.
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