Invention Grant
- Patent Title: X-ray radiation source
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Application No.: US14763949Application Date: 2013-11-05
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Publication No.: US09648712B2Publication Date: 2017-05-09
- Inventor: Tatsuya Nakamura , Norimasa Kosugi , Naoki Okumura , Yoshitaka Sato , Akira Matsumoto , Yoshihisa Marushima , Kazuhito Nakamura
- Applicant: Futaba Corporation , HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Mobara-shi, Chiba JP Hamamatsu-shi, Shizuoka
- Assignee: Futaba Corporation,HAMAMATSU PHOTONICS K.K.
- Current Assignee: Futaba Corporation,HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Mobara-shi, Chiba JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2013-014175 20130129
- International Application: PCT/JP2013/079921 WO 20131105
- International Announcement: WO2014/119079 WO 20140807
- Main IPC: H05G1/10
- IPC: H05G1/10 ; H01J35/06 ; H01J35/08 ; H01J35/16 ; H05G1/06

Abstract:
In an X-ray radiation source, a counter wall made of alkali-containing glass, out of walls of a housing of an X-ray tube, is arranged opposite to a high-voltage region VH of a power supply unit including a high-voltage generation module which generates a negative high voltage to be applied to a filament. This configuration prevents an electric field from being generated in the counter wall and thus suppresses precipitation of alkali ions from the glass. Therefore, it prevents change in potential relationship between electrodes at different potentials such as the filament, grid, and target and prevents occurrence of a trouble of failure in maintaining a desired X-ray amount, thus enabling stable operation to be maintained.
Public/Granted literature
- US20150382440A1 X-RAY RADIATION SOURCE Public/Granted day:2015-12-31
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