Invention Grant
- Patent Title: Hot plate and method of manufacturing the same
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Application No.: US14353199Application Date: 2012-10-19
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Publication No.: US09657394B2Publication Date: 2017-05-23
- Inventor: Ick Chan Kim , Moo Seong Kim
- Applicant: LG INNOTEK CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Eisenschenk
- Priority: KR10-2011-0107200 20111019
- International Application: PCT/KR2012/008622 WO 20121019
- International Announcement: WO2013/058610 WO 20130425
- Main IPC: H05B3/68
- IPC: H05B3/68 ; H05B3/74 ; C23C26/00 ; C23C16/458 ; H01L21/67

Abstract:
Disclosed are a hot plate and a method of manufacturing the same. The method includes the steps of preparing a first barrier layer, laminating a first heat transfer layer on the first barrier layer, and laminating a second barrier layer on the first heat transfer layer. The first barrier layer or the second barrier layer includes a plurality of first sub-nano-barrier layers and a plurality of second sub-nano-barrier layers. The hot plate includes a first barrier layer, a first heat transfer layer on the first barrier layer, and a second barrier layer on the first heat transfer layer. The first barrier layer or the second barrier layer includes a plurality of first sub-nano-barrier layers and a plurality of second sub-nano-barrier layers.
Public/Granted literature
- US20140251976A1 HOT PLATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-09-11
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