Invention Grant
- Patent Title: Copper feature design for warpage control of substrates
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Application No.: US14754585Application Date: 2015-06-29
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Publication No.: US09659131B2Publication Date: 2017-05-23
- Inventor: Edmund Blackshear , Anson Jay Call , Vijayeshwar Das Khanna , Douglas Oliver Powell , David John Russell
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Roberts Mlotkowski Safran Cole & Calderon P.C.
- Agent David Cain; Andrew M. Calderon
- Main IPC: H05K1/03
- IPC: H05K1/03 ; G06F17/50 ; H01L23/00 ; H01L23/498 ; H01L23/14

Abstract:
An approach is provided in which a laminate substrate includes top layers, bottom layers, and a core layer. The top layers are positioned between the core layer and a top surface metallurgy (TSM) layer and include at least one top conductive layer. The bottom layers are positioned between the core layer and a bottom surface metallurgy (BSM) layer and include at least one bottom conductive layer includes a material void pattern that is based upon the top conductive layer and reduces warpage of the laminate substrate.
Public/Granted literature
- US20150317423A1 Copper Feature Design for Warpage Control of Substrates Public/Granted day:2015-11-05
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