Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
-
Application No.: US14679144Application Date: 2015-04-06
-
Publication No.: US09660102B2Publication Date: 2017-05-23
- Inventor: Hiromichi Godo , Kengo Akimoto , Shunpei Yamazaki
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2009-045536 20090227
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/786 ; H01L29/66 ; H01L29/24 ; H01L21/02

Abstract:
An object is to reduce to reduce variation in threshold voltage to stabilize electric characteristics of thin film transistors each using an oxide semiconductor layer. An object is to reduce an off current. The thin film transistor using an oxide semiconductor layer is formed by stacking an oxide semiconductor layer containing insulating oxide over the oxide semiconductor layer so that the oxide semiconductor layer and source and drain electrode layers are in contact with each other with the oxide semiconductor layer containing insulating oxide interposed therebetween; whereby, variation in threshold voltage of the thin film transistors can be reduced and thus the electric characteristics can be stabilized. Further, an off current can be reduced.
Public/Granted literature
- US20150214383A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-07-30
Information query
IPC分类: