- 专利标题: Voltage supply for electrical focusing of electron beams
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申请号: US14494337申请日: 2014-09-23
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公开(公告)号: US09660597B2公开(公告)日: 2017-05-23
- 发明人: Josef Deuringer , Jürgen Oelschlegel
- 申请人: Josef Deuringer , Jürgen Oelschlegel
- 申请人地址: DE München
- 专利权人: Siemens Aktiengesellschaft
- 当前专利权人: Siemens Aktiengesellschaft
- 当前专利权人地址: DE München
- 代理机构: Lempia Summerfield Katz LLC
- 优先权: DE102013219173 20130924
- 主分类号: H02M3/158
- IPC分类号: H02M3/158 ; H03F3/21 ; H01J29/58 ; H02M1/088 ; H03F3/08 ; H03F3/217 ; H05G1/52
摘要:
A rapidly regulable high-voltage supply for the electrical focusing of an electron beam using a high-voltage final stage is provided. The high-voltage final stage includes a plurality of amplification elements that are interconnected in a series configuration with a first high-voltage connection, and a potential dividing chain including a series of potential dividing elements. The potential dividing chain is interconnected with the first high-voltage connection and has a signal interconnection with the plurality of amplification elements, so that when a voltage is applied across the potential dividing chain, a difference in voltages between a signal input to any amplification element of the plurality of amplification elements and a signal input to a next amplification element of the plurality of amplification elements has a same sign.
公开/授权文献
- US20150084502A1 Voltage Supply for Electrical Focusing of Electron Beams 公开/授权日:2015-03-26
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