Invention Grant
- Patent Title: High performance compliant substrate
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Application No.: US14686671Application Date: 2015-04-14
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Publication No.: US09666514B2Publication Date: 2017-05-30
- Inventor: Cyprian Emeka Uzoh , Rajesh Katkar
- Applicant: Invensas Corporation
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Agency: Haynes and Boone, LLP
- Main IPC: H05K1/00
- IPC: H05K1/00 ; H01L23/498 ; H01L21/48 ; H01L23/538 ; H01L23/15

Abstract:
A substrate structure is presented that can include a porous polyimide material and electrodes formed in the porous polyimide material. In some examples, a method of forming a substrate can include depositing a barrier layer on a substrate; depositing a resist over the barrier layer; patterning and etching the resist; forming electrodes; removing the resist; depositing a porous polyimide aerogel; depositing a dielectric layer over the aerogel material; polishing a top side of the interposer to expose the electrodes; and removing the substrate from the bottom side of the interposer.
Public/Granted literature
- US20160307824A1 HIGH PERFORMANCE COMPLIANT SUBSTRATE Public/Granted day:2016-10-20
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