Invention Grant
- Patent Title: Semiconductor device and method of forming conductive layer over substrate with vents to channel bump material and reduce interconnect voids
-
Application No.: US14572298Application Date: 2014-12-16
-
Publication No.: US09679846B2Publication Date: 2017-06-13
- Inventor: JaeHyun Lee , SunJae Kim , JoongGi Kim
- Applicant: STATS ChipPAC, Ltd.
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/528 ; H01L23/498 ; H01L21/48 ; H01L23/31 ; H01L21/768 ; H01L23/522 ; H01L23/525 ; H01L21/56 ; H01L23/00

Abstract:
A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the semiconductor die. A first conductive layer having first and second segments is formed over a surface of the substrate with a first vent separating an end of the first segment and the second segment and a second vent separating an end of the second segment and the first segment. A second conductive layer is formed over the surface of the substrate to electrically connect the first segment and second segment. The thickness of the second conductive layer can be less than a thickness of the first conductive layer to form the first vent and second vent. The semiconductor die is mounted to the substrate with the bumps aligned to the first segment and second segment. Bump material from reflow of the bumps is channeled into the first vent and second vent.
Public/Granted literature
Information query
IPC分类: