- Patent Title: Composition for base, and directed self-assembly lithography method
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Application No.: US14691043Application Date: 2015-04-20
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Publication No.: US09690192B2Publication Date: 2017-06-27
- Inventor: Hiroyuki Komatsu , Takehiko Naruoka , Shinya Minegishi , Kaori Sakai , Tomoki Nagai
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-087752 20140421
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/461 ; C03C15/00 ; C03C25/68 ; C23F1/00 ; G03F7/00 ; H01L21/3065 ; B05D3/06 ; H01L21/027 ; C09D125/14 ; H01L21/033
Abstract:
A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. AB)n (1)
Public/Granted literature
- US20150301445A1 COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD Public/Granted day:2015-10-22
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