发明授权
- 专利标题： Apparatus for treating substrate and method for discharging supercritical fluid
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申请号： US13537960申请日： 2012-06-29
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公开(公告)号： US09691638B2公开(公告)日： 2017-06-27
- 发明人: Yong Hyun Choi , Kibong Kim , Woo Young Kim , Jeong Seon Park
- 申请人： Yong Hyun Choi , Kibong Kim , Woo Young Kim , Jeong Seon Park
- 申请人地址： KR Chungcheongnam-Do
- 专利权人： SEMES CO., LTD.
- 当前专利权人： SEMES CO., LTD.
- 当前专利权人地址： KR Chungcheongnam-Do
- 代理机构： Harness, Dickey & Pierce, PLC
- 优先权： KR10-2011-0064988 20110630; KR10-2011-0104767 20111013
- 主分类号： F26B25/06
- IPC分类号： F26B25/06 ; F26B7/00 ; H01L21/67
摘要：
Provided are an apparatus for treating a substrate and a method for discharge a supercritical fluid, and more particularly, an apparatus for treating a substrate using a supercritical fluid and a method for discharging the supercritical fluid using the same. The apparatus for treating the substrate includes a container for providing a supercritical fluid, a vent line through which the supercritical fluid is discharged from the container, and a freezing prevention unit disposed in the vent line to prevent the supercritical fluid from being frozen.
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