Invention Grant
- Patent Title: Substrate processing apparatus, method of operating substrate processing apparatus, and storage medium
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Application No.: US14649615Application Date: 2013-12-05
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Publication No.: US09696262B2Publication Date: 2017-07-04
- Inventor: Katsuhiro Morikawa , Ikuo Sunaka
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-Ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-Ku
- Agency: Burr & Brown, PLLC
- Priority: JP2012-268687 20121207
- International Application: PCT/JP2013/082744 WO 20131205
- International Announcement: WO2014/088078 WO 20140612
- Main IPC: G01N21/88
- IPC: G01N21/88 ; H01L21/673 ; H01L21/67 ; H01L21/677

Abstract:
A substrate processing apparatus includes: a load port into which the transport container is carried; a detecting unit that detects storage condition of the substrates which are contained in the transport container, which has been carried into the load port and the lid of which has been removed; a processing unit that processes the substrates removed from the transport container having been carried into the load port; and a control unit. The control unit performs a first step that detects storage condition of the substrates, which are contained in the transport container having been carried into the load port, before the substrates are removed from the transport container to be delivered to the processing unit; a second step that detects storage condition of the substrates, which have been processed in the processing unit and returned to the original transport container, before closing the lid; and a third step that judges whether or not the transport container has an abnormality based on results of the first and second steps.
Public/Granted literature
- US20150300960A1 SUBSTRATE PROCESSING APPARATUS, METHOD OF OPERATING SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM Public/Granted day:2015-10-22
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