Invention Grant
- Patent Title: Mask including pellicle, pellicle repairing apparatus, and substrate manufacturing equipment
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Application No.: US14755693Application Date: 2015-06-30
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Publication No.: US09703186B2Publication Date: 2017-07-11
- Inventor: Mun Ja Kim , Byunggook Kim , Jongju Park , Jaehyuck Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2014-0158824 20141114
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64
Abstract:
Provided is a mask. The mask may include a mask substrate, mask patterns on the mask substrate, frames disposed on an edge of the mask substrate outside the mask patterns, and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle includes protection layers each of which has a nanometer thickness.
Public/Granted literature
- US20160139501A1 Mask Including Pellicle, Pellicle Repairing Apparatus, and Substrate Manufacturing Equipment Public/Granted day:2016-05-19
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