公开(公告)号：US12258494B2

公开(公告)日：2025-03-25

申请号：US18236515

申请日：2023-08-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Mun Ja Kim ,  Changyoung Jeong

IPC: C09J129/04 ,  C08K3/36 ,  C08K5/13 ,  C09J11/04 ,  C09J11/06 ,  C09J179/02 ,  G03F1/64

Abstract: An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water.

公开(公告)号：US12018183B2

公开(公告)日：2024-06-25

申请号：US17516428

申请日：2021-11-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mun Ja Kim ,  Byungchul Yoo ,  Haeshin Lee ,  Chang Young Jeong ,  Yunhan Lee

IPC: C09J129/04 ,  C08H7/00 ,  C08K3/04 ,  C08K3/36 ,  C08K5/05 ,  G03F1/64

CPC classification number: C09J129/04 ,  C08K3/042 ,  C08K3/36 ,  C08K5/05 ,  G03F1/64 ,  C08H6/00

Abstract: An adhesive composition, a method for preparing the same, a reticle assembly including the same, and a method for fabricating the reticle assembly including the same are provided. The adhesive composition includes a polyphenol compound including tannic acid, a polymer including polyvinyl alcohol, and a solvent including water and alcohol.

公开(公告)号：US20140220481A1

公开(公告)日：2014-08-07

申请号：US14136560

申请日：2013-12-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mun Ja Kim ,  Donggun Lee ,  Seongsue Kim

IPC: G03F1/48

CPC classification number: G03F1/48

Abstract: The present inventive concept provides a photomask including a substrate, patterns disposed on the substrate, and an anti-contamination layer disposed on the patterns. The anti-contamination layer includes at least one graphene layer. Methods of fabricating a semiconductor device including the same are also provided.

Abstract translation: 本发明构思提供了一种光掩模，其包括基板，设置在基板上的图案，以及设置在图案上的抗污染层。 抗污染层包括至少一个石墨烯层。 还提供了制造包括该半导体器件的半导体器件的方法。

公开(公告)号：US12297379B2

公开(公告)日：2025-05-13

申请号：US18404861

申请日：2024-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mun Ja Kim ,  Byungchul Yoo ,  Haeshin Lee ,  Chang Young Jeong ,  Yunhan Lee

IPC: C09J129/04 ,  C08K3/04 ,  C08K3/36 ,  C08K5/05 ,  G03F1/64 ,  C08H7/00

Abstract: An adhesive composition, a method for preparing the same, a reticle assembly including the same, and a method for fabricating the reticle assembly including the same are provided. The adhesive composition includes a polyphenol compound including tannic acid, a polymer including polyvinyl alcohol, and a solvent including water and alcohol.

公开(公告)号：US11729896B2

公开(公告)日：2023-08-15

申请号：US17468644

申请日：2021-09-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jihoon Na ,  Mun Ja Kim ,  Jaewhan Sung ,  Byungchul Yoo ,  Jibeom Yoo ,  Hakseok Lee ,  Myeongjin Jeong ,  Hyunjune Cho

IPC: H05G2/00 ,  G03F7/20 ,  G02B5/20 ,  G02B5/08 ,  G03F7/00

CPC classification number: H05G2/008 ,  G02B5/0891 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

Abstract: An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.

公开(公告)号：US10437143B2

公开(公告)日：2019-10-08

申请号：US15627916

申请日：2017-06-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwan-chul Jeon ,  Mun Ja Kim ,  Sung-won Kwon ,  Hee-bom Kim ,  Chang-young Jeong

IPC: G03F1/64 ,  G03F1/22 ,  G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.

公开(公告)号：US10001700B2

公开(公告)日：2018-06-19

申请号：US15034014

申请日：2014-06-03

Applicant: Samsung Electronics Co., Ltd. ,  Research & Business Foundation SUNGKYUNKWAN UNIVERSITY ,  Fine Semitech Co., Ltd.

Inventor： Mun Ja Kim ,  Ji-beom Yoo ,  Seul-gi Kim ,  Sang-jin Cho ,  Myung-shik Chang ,  Jang-dong You

IPC: G03F1/22 ,  G03F1/62 ,  G03F1/64

CPC classification number: G03F1/64 ,  G03F1/22 ,  G03F1/62

Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.

公开(公告)号：US11448957B2

公开(公告)日：2022-09-20

申请号：US17014561

申请日：2020-09-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Mun Ja Kim ,  Changyoung Jeong

IPC: G03F1/66 ,  G03F1/62 ,  G03F7/20

Abstract: A pellicle transfer apparatus includes; a base including supporting a target plate, a pellicle and a flexible plate sequentially stacked on the base, and a roller unit laterally movable in a first direction across the base and including a lower roller extending in a second direction intersecting the first direction, and an upper roller above the lower roller and extending in the second direction, wherein the lower roller compresses the flexible plate while the roller unit laterally moves in the first direction across the base to bond the pellicle to the target plate, as the pellicle is separated from the flexible plate, and the flexible plate moves upward to wrap around the lower roller, and the upper roller contacts the flexible plate as it wraps around the lower roller.

公开(公告)号：US11262648B2

公开(公告)日：2022-03-01

申请号：US16940590

申请日：2020-07-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mun Ja Kim ,  Changyoung Jeong

IPC: G03F1/62

Abstract: A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane incudes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.

公开(公告)号：US11073757B2

公开(公告)日：2021-07-27

申请号：US16598180

申请日：2019-10-10

Applicant: Samsung Electronics Co., Ltd. ,  Research & Business Foundation SUNGKYUNKWAN UNIVERSITY

Inventor： Mun Ja Kim ,  Seulgi Kim ,  Kibong Nam ,  Jinho Yeo ,  Jibeom Yoo

IPC: G03F1/64 ,  G03F1/62

Abstract: Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.