Invention Grant
- Patent Title: Silicon controlled rectifier
-
Application No.: US15179162Application Date: 2016-06-10
-
Publication No.: US09704851B2Publication Date: 2017-07-11
- Inventor: Gijs Jan De Raad , Guido Wouter Willem Quax
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP15175743 20150707
- Main IPC: H01L29/74
- IPC: H01L29/74 ; H01L27/02

Abstract:
A silicon controlled rectifier, an electrostatic discharge (ESD) protection circuit including the silicon controlled rectifier and an integrated circuit including the silicon controlled rectifier or ESD protection circuit. The silicon controlled rectifier includes a first region having a first conductivity type and a second region having a second conductivity type located adjacent the first region in a semiconductor substrate. A junction is formed at a boundary between the first region and the second region. Contact regions of the first conductivity type and the second conductivity type located in each of the first region and the second region. A further contact region of the second conductivity type is located in the second region, in between the contact region of the first conductivity type and the junction. The further contact region and the contact region of the second conductivity type in the second region are connected together for biasing the second region.
Public/Granted literature
- US20170012037A1 Silicon Controlled Rectifier Public/Granted day:2017-01-12
Information query
IPC分类: