Invention Grant
- Patent Title: Semiconductor device and method of forming RF FEM with LC filter and IPD filter over substrate
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Application No.: US13678134Application Date: 2012-11-15
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Publication No.: US09704857B2Publication Date: 2017-07-11
- Inventor: HyunTai Kim , YongTaek Lee , Gwang Kim , ByungHoon Ahn , Kai Liu
- Applicant: STATS ChipPAC, Ltd.
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Pte. Ltd.
- Current Assignee: STATS ChipPAC, Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01G9/00
- IPC: H01G9/00 ; H01L21/00 ; H01L27/06 ; H01L21/56 ; H01L23/31 ; H01L23/64 ; H01L23/66 ; H01L27/01 ; H01L49/02 ; H01L27/08 ; H01L23/00

Abstract:
A semiconductor device has a substrate and RF FEM formed over the substrate. The RF FEM includes an LC low-pass filter having an input coupled for receiving a transmit signal. A Tx/Rx switch has a first terminal coupled to an output of the LC filter. A diplexer has a first terminal coupled to a second terminal of the Tx/Rx switch and a second terminal for providing an RF signal. An IPD band-pass filter has an input coupled to a third terminal of the Tx/Rx switch and an output providing a receive signal. The LC filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The IPD filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The RF FEM substrate can be stacked over a semiconductor package containing an RF transceiver.
Public/Granted literature
- US20130069197A1 Semiconductor Device and Method of Forming RF FEM with LC Filter and IPD Filter Over Substrate Public/Granted day:2013-03-21
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