Invention Grant
- Patent Title: Lithographic apparatus, substrate support system, device manufacturing method and control program
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Application No.: US14647778Application Date: 2013-11-25
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Publication No.: US09715182B2Publication Date: 2017-07-25
- Inventor: Marinus Maria Johannes Van De Wal , Wilhelmus Henricus Theodorus Maria Aangenent , Ramidin Izair Kamidi , Khalid Manssouri
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/074613 WO 20131125
- International Announcement: WO2014/082961 WO 20140605
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.
Public/Granted literature
- US20150316860A1 LITHOGRAPHIC APPARATUS, SUBSTRATE SUPPORT SYSTEM, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM Public/Granted day:2015-11-05
Information query
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