Invention Grant
- Patent Title: Device, lithographic apparatus, method for guiding radiation and device manufacturing method
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Application No.: US14365549Application Date: 2013-01-24
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Publication No.: US09715183B2Publication Date: 2017-07-25
- Inventor: Wouter Dick Koek , Arno Jan Bleeker , Erik Roelof Loopstra , Heine Melle Mulder , Erwin John Van Zwet , Dries Smeets , Robert Paul Ebeling
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/051355 WO 20130124
- International Announcement: WO2013/124114 WO 20130829
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; G02B6/42

Abstract:
A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
Public/Granted literature
- US20140347641A1 DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD Public/Granted day:2014-11-27
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