Invention Grant
- Patent Title: Substrate cleaning method
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Application No.: US15204068Application Date: 2016-07-07
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Publication No.: US09716002B2Publication Date: 2017-07-25
- Inventor: Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2006-343309 20061220; JP2007-303453 20071122
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B08B3/02 ; H01L21/67 ; B08B1/00 ; B08B1/04 ; B08B5/02 ; B08B7/00 ; H01L21/687
Abstract:
A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.
Public/Granted literature
- US20160314958A1 SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM Public/Granted day:2016-10-27
Information query
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