Invention Grant
- Patent Title: Electron beam plasma source with reduced metal contamination
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Application No.: US13912488Application Date: 2013-06-07
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Publication No.: US09721760B2Publication Date: 2017-08-01
- Inventor: Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Kartik Ramaswamy , Nipun Misra , Gonzalo Antonio Monroy , James D. Carducci , Steven Lane
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H05H1/02
- IPC: H05H1/02 ; H01J37/32 ; H05H1/50
Abstract:
In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.
Public/Granted literature
- US20140338835A1 ELECTRON BEAM PLASMA SOURCE WITH REDUCED METAL CONTAMINATION Public/Granted day:2014-11-20
Information query
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