公开(公告)号：US20180274089A1

公开(公告)日：2018-09-27

申请号：US15717822

申请日：2017-09-27

Applicant: Applied Materials, Inc.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Gonzalo Antonio Monroy ,  Lucy Chen ,  Yue Guo

IPC: C23C16/27 ,  C23C16/505 ,  C23C16/56 ,  H01J37/32

Abstract: A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.

公开(公告)号：US10544505B2

公开(公告)日：2020-01-28

申请号：US15717822

申请日：2017-09-27

Applicant: Applied Materials, Inc.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Gonzalo Antonio Monroy ,  Lucy Chen ,  Yue Guo

IPC: C23C16/26 ,  C23C14/30 ,  C23C16/27 ,  C23C16/505 ,  C23C16/56 ,  H01J37/32 ,  C23C16/44 ,  C23C16/48 ,  C23C16/52 ,  H01J37/302 ,  H01J37/317 ,  H01L21/02

Abstract: A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.

公开(公告)号：US20180274100A1

公开(公告)日：2018-09-27

申请号：US15717897

申请日：2017-09-27

Applicant: Applied Materials, Inc.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Eswaranand Venkatasubramanian ,  Kenneth S. Collins ,  Steven Lane ,  Gonzalo Antonio Monroy ,  Lucy Chen ,  Yue Guo

IPC: C23C16/48 ,  C23C16/27 ,  C23C16/52 ,  C23C16/56 ,  C23C16/44 ,  H01L21/02 ,  H01J37/32 ,  H01J37/302 ,  H01J37/317

CPC classification number: C23C16/272 ,  C23C16/26 ,  C23C16/4412 ,  C23C16/487 ,  C23C16/505 ,  C23C16/52 ,  C23C16/56 ,  H01J37/302 ,  H01J37/317 ,  H01J37/32082 ,  H01J37/3233 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32715 ,  H01J2237/332 ,  H01J2237/3321 ,  H01L21/02115 ,  H01L21/022 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/0234 ,  H01L21/02351

Abstract: A method of forming a layer of diamond-like carbon on a workpiece includes supporting the workpiece in a chamber with the workpiece facing an upper electrode, and forming a plurality of successive sublayers to form the layer of layer of diamond-like carbon by alternating between depositing a sublayer of diamond-like carbon on the workpiece in the chamber and treating the sublayer with a plasma of the inert gas or an electron beam from the upper electrode.

公开(公告)号：US09721760B2

公开(公告)日：2017-08-01

申请号：US13912488

申请日：2013-06-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Nipun Misra ,  Gonzalo Antonio Monroy ,  James D. Carducci ,  Steven Lane

IPC: H05H1/02 ,  H01J37/32 ,  H05H1/50

CPC classification number: H01J37/3233 ,  H01J37/3266 ,  H05H1/50

Abstract: In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

公开(公告)号：US20140338835A1

公开(公告)日：2014-11-20

申请号：US13912488

申请日：2013-06-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Nipun Misra ,  Gonzalo Antonio Monroy ,  James D. Carducci ,  Steven Lane

IPC: H05H1/02

CPC classification number: H01J37/3233 ,  H01J37/3266 ,  H05H1/50

Abstract: In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

Abstract translation: 在用于处理工件的等离子体反应器中，使用电子束作为等离子体源，并且从电子束中去除溅射的金属原子以减少污染。