Systems, methods, and devices for generating predominantly radially expanded plasma flow

    公开(公告)号:US12058801B2

    公开(公告)日:2024-08-06

    申请号:US18538270

    申请日:2023-12-13

    发明人: Nikolay Suslov

    IPC分类号: H05H1/46 H05H1/02 H05H1/54

    摘要: Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.

    Microwave plasma source
    8.
    发明授权

    公开(公告)号:US11259397B2

    公开(公告)日:2022-02-22

    申请号:US16652434

    申请日:2018-11-22

    发明人: Hitoshi Kuninaka

    IPC分类号: H05H1/46 H05H1/02

    摘要: In a microwave plasma source, a tubular magnet portion has a first opening end and a second opening end. The first opening end has a first polarity, and the second opening end has a second polarity. The tubular body is surrounded by the tubular magnet portion. A first magnetic circuit portion closes the first opening end. A second magnetic circuit portion is disposed opposite to the first magnetic circuit portion. The second magnetic circuit portion has a first opening part. An antenna penetrates the first magnetic circuit portion, is introduced to a space, and supplies microwave power to the space. The nozzle portion has a second opening part that has a smaller opening area than the first opening part and communicates with the first opening part. When an inner diameter of the tubular body is represented by a (mm), and a microwave cutoff wavelength of the microwave power being supplied to the space is represented by λ (mm), the microwave plasma source is configured to satisfy a relational expression λ>3.41×(a/2).