Invention Grant
- Patent Title: Method for manufacturing semiconductor device
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Application No.: US15276993Application Date: 2016-09-27
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Publication No.: US09722056B2Publication Date: 2017-08-01
- Inventor: Shunpei Yamazaki , Akihisa Shimomura , Yasumasa Yamane , Yuhei Sato , Tetsuhiro Tanaka , Masashi Tsubuku , Toshihiko Takeuchi , Ryo Tokumaru , Mitsuhiro Ichijo , Satoshi Toriumi , Takashi Ohtsuki , Toshiya Endo
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-Shi, Kanagawa-Ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-Shi, Kanagawa-Ken
- Agency: Fish & Richardson P.C.
- Priority: JP2013-267525 20131225
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/66 ; H01L29/786 ; H01L21/02

Abstract:
A change in electrical characteristics is suppressed and reliability in a semiconductor device using a transistor including an oxide semiconductor is improved. Oxygen is introduced into a surface of an insulating film, and then, an oxide semiconductor, a layer which is capable of blocking oxygen, a gate insulating film, and other films which composes a transistor are formed. For at least one of the first gate insulating film and the insulating film, three signals in Electron Spin Resonance Measurement are each observed in a certain range of g-factor. Reducing the sum of the spin densities of the signals will improve reliability of the semiconductor device.
Public/Granted literature
- US20170018631A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-01-19
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