Invention Grant
- Patent Title: Testing method and testing system for semiconductor element
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Application No.: US13863383Application Date: 2013-04-16
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Publication No.: US09726713B2Publication Date: 2017-08-08
- Inventor: Tzung-Te Chen , Chun-Fan Dai , Han-Kuei Fu , Chien-Ping Wang , Pei-Ting Chou
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW101137506A 20121011
- Main IPC: G01R31/26
- IPC: G01R31/26 ; G01R31/00 ; G01R31/27

Abstract:
A testing method and testing system for a semiconductor element are provided. The method includes following steps. A level of a testing electrostatic discharge (ESD) voltage is determined. A plurality of sample components is provided. The testing ESD voltage is imposed on the sample components for testing ESD decay rates of the sample components. ESD withstand voltages of the sample components are detected. The relation between the ESD withstand voltages and the electrostatic discharge rates are recorded to a database. The testing ESD voltage is imposed on the semiconductor element for testing an ESD decay rate of the semiconductor element. The database is looked up according to the ESD decay rate of the semiconductor element to determine an ESD withstand voltage of the semiconductor element.
Public/Granted literature
- US20140107961A1 TESTING METHOD AND TESTING SYSTEM FOR SEMICONDUCTOR ELEMENT Public/Granted day:2014-04-17
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