Invention Grant
- Patent Title: Method for preparing film patterns
-
Application No.: US14400931Application Date: 2013-12-04
-
Publication No.: US09728413B2Publication Date: 2017-08-08
- Inventor: Yuqing Yang , Seung Yik Park , Byung Chun Lee
- Applicant: BOE Technology Group Co., Ltd. , CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Chengdu
- Assignee: BOE Technology Group Co., Ltd.,Chengdu BOE Optoelectronics Technology Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.,Chengdu BOE Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Chengdu
- Agency: Banner & Witcoff, Ltd.
- Priority: CN201310432089 20130922
- International Application: PCT/CN2013/088556 WO 20131204
- International Announcement: WO2015/039383 WO 20150326
- Main IPC: H01L21/283
- IPC: H01L21/283 ; H01L21/285 ; H01L31/18 ; G06F3/041 ; H01L21/033 ; H01L21/28 ; H01L27/12 ; H01L29/43
Abstract:
A method for preparing film patterns; firstly, a complementary film pattern (1) to a desired film pattern (201) is prepared on a substrate (3) with an erasable agent; secondly, a whole layer of film (2) is formed on the complementary film pattern (1); and thirdly, the desired film pattern (201) is obtained by removing the complementary film pattern (1). The preparation method can simplify the production process and reduce the production cost of the film patterns.
Public/Granted literature
- US20160260614A1 METHOD FOR PREPARING FILM PATTERNS Public/Granted day:2016-09-08
Information query
IPC分类:
