- 专利标题: Processing-liquid supply apparatus and processing-liquid supply method
-
申请号: US14497930申请日: 2014-09-26
-
公开(公告)号: US09732910B2公开(公告)日: 2017-08-15
- 发明人: Koji Takayanagi , Kousuke Yoshihara , Yuichi Terashita , Toshinobu Furusho , Takashi Sasa
- 申请人: TOKYO ELECTRON LIMITED
- 申请人地址: JP Minato-ku
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2013-207376 20131002
- 主分类号: F17D3/01
- IPC分类号: F17D3/01
摘要:
A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.
公开/授权文献
信息查询