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公开(公告)号：US11476136B2
公开(公告)日：2022-10-18
申请号：US16669965
申请日：2019-10-31
发明人： Kenichi Shigetomi , Takeshi Saikusa , Eiichi Sekimoto , Takayuki Fukudome , Kousuke Yoshihara , Suguru Enokida , Kazuhiro Takeshita , Kazuto Umeki
摘要： A substrate processing apparatus includes plural heating modules each including a table on which a substrate is placed to be heated, the substrate having plural heated zones. The table has plural heaters each assigned to heat respective ones of the heated zones. Heat generation of the heaters is controlled independently. A control unit controls the heaters such that integrated quantities of heat of the respective heated zones given by the corresponding heaters from first to second time point are substantially identical to each other in each of the heating modules, and are substantially identical to each other among the heating modules. The first time point is set when a temperature transition profile of the substrate is rising toward a process temperature after placing the substrate on the table under a condition where heat generation of the heaters is stable. The second time point is set after the temperature transition profile reaches the process temperature.
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公开(公告)号：US09947534B2
公开(公告)日：2018-04-17
申请号：US14813820
申请日：2015-07-30
IPC分类号： B05D3/12 , H01L21/033 , B05D1/00 , B05C11/02 , H01L21/67 , G03F7/16 , H01L21/027 , H01L51/00 , G06F19/00
CPC分类号： H01L21/0337 , B05C11/023 , B05D1/005 , G03F7/162 , G06F19/00 , H01L21/0271 , H01L21/6715 , H01L51/0003 , H01L2224/03418
摘要： A coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.
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公开(公告)号：US09732910B2
公开(公告)日：2017-08-15
申请号：US14497930
申请日：2014-09-26
IPC分类号： F17D3/01
CPC分类号： F17D3/01 , F17C1/00 , Y10T137/0318 , Y10T137/794
摘要： A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.
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4.发明授权Substrate cleaning method, substrate cleaning apparatus and storage medium for cleaning substrate 有权基板清洗方法，基板清洗装置和清洁基板的存储介质公开(公告)号：US09307653B2
公开(公告)日：2016-04-05
申请号：US13733370
申请日：2013-01-03
CPC分类号： H05K3/26 , B08B3/024 , B08B5/02 , H01L21/67028 , H01L21/67034 , H05K2203/1509
摘要： A substrate cleaning method is capable of preventing a liquid stream on a substrate from being cut and circuit patterns thereon from being damaged. The substrate cleaning method includes a liquid film forming process that forms a liquid film on an entire substrate surface by supplying a cleaning liquid L from a central portion of the substrate W toward a peripheral portion thereof while rotating the substrate; a drying region forming process that discharges a gas G on the substrate surface and removes the cleaning liquid on the substrate surface; and a residual liquid removing process that removes the cleaning liquid remaining between the circuit patterns by discharging a gas G while moving in a diametrical direction of the substrate.
摘要翻译： 基板清洗方法能够防止基板上的液体流被切断，并且其上的电路图案被损坏。 基板清洗方法包括：通过在旋转基板的同时从基板W的中心部向其周边部供给清洗液L而在整个基板面上形成液膜的液膜形成工序; 干燥区域形成工序，其在基板表面上排出气体G并除去基板表面上的清洗液体; 以及残留液体去除处理，其通过沿着基板的直径方向移动而排出气体G而除去残留在电路图案之间的清洗液。
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公开(公告)号：US20150151227A1
公开(公告)日：2015-06-04
申请号：US14541450
申请日：2014-11-14
发明人： Koji TAKAYANAGI , Kousuke Yoshihara
CPC分类号： B01D35/34 , B01D35/02 , H01L21/67017
摘要： A filter device includes a housing having space, a filter in the space of the housing, a first joint connected to a first port of the housing and having an open end which connects to a supply path of a processing liquid, a second joint connected to a second port of the housing and having an open end which connects to the path, and an exhaust joint connected to an exhaust port of the housing and having an open end which connects to an exhaust path. The first and second ports introduce or discharge the liquid and have openings to the opposite end portions of the space, respective, the filter is intersecting a straight line passing through the centers of the first and second ports, and the first, the second and exhaust joints are formed to extend in the same direction outside the space of the housing.
摘要翻译： 过滤装置包括具有空间的壳体，壳体空间中的过滤器，连接到壳体的第一端口并具有连接到处理液体的供给路径的开口端的第一接头，连接到处理液体的供给路径的第二接头 壳体的第二端口并且具有连接到路径的开口端，以及连接到壳体的排气口并且具有连接到排气路径的开口端的排气接头。 第一和第二端口引入或排出液体并且具有到空间的相对端部的开口，相应地，过滤器与穿过第一和第二端口的中心的直线相交，第一和第二端口 接头形成为在壳体的空间外侧沿相同的方向延伸。
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6.发明申请PROCESSING LIQUID SUPPLYING APPARATUS AND PROCESSING LIQUID SUPPLYING METHOD 审中-公开处理液体供应设备和处理液体供应方法公开(公告)号：US20150092167A1
公开(公告)日：2015-04-02
申请号：US14485914
申请日：2014-09-15
IPC分类号： G03F7/20
CPC分类号： H01L21/67017
摘要： Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.
摘要翻译： 公开了一种处理液供给装置。 该装置包括：处理液供给源，被配置为提供用于处理待处理基板的处理液; 喷射单元，被配置为将处理液喷射到待处理的基板; 被配置为去除处理液中的异物的过滤装置; 供给泵和喷射泵，其分别设置在所述供给路径中的所述过滤装置的初级侧和次级侧; 以及控制单元，其被配置为输出控制信号，以通过使用所述供给泵和所述喷射泵中的一个来对从所述处理液体供给源供给的处理液进行解压缩和脱气，并且随后将所述脱气处理液通过所述过滤装置，从 通过使用供应泵和排出泵将过滤装置的次级侧的初级侧。
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公开(公告)号：US08791030B2
公开(公告)日：2014-07-29
申请号：US13952739
申请日：2013-07-29
发明人： Fumiko Iwao , Satoru Shimura , Kousuke Yoshihara
CPC分类号： H01L21/02104 , H01L21/02087 , H01L21/0337 , H01L21/67051 , H01L21/6708
摘要： In the present invention, a masking solution is supplied to an edge portion of a front surface of a substrate rotated around a vertical axis to form a masking film at the edge portion of the substrate, a hard mask solution is supplied to the front surface of the substrate to form a hard mask film on the front surface of the substrate, a hard mask film removing solution dissolving the hard mask film is supplied to the hard mask film formed at the edge portion of the substrate to remove the hard mask film formed at the edge portion of the substrate, and a masking film removing solution dissolving the masking film is supplied to the masking film to remove the masking film at the edge portion of the substrate.
摘要翻译： 在本发明中，将掩模溶液供给到在垂直轴上旋转的基板的前表面的边缘部分，以在基板的边缘部分形成掩模膜，将硬掩模溶液供给到 在基板的正面上形成硬掩模膜的基板，将硬膜掩模膜溶解的硬掩模膜去除溶液供给到形成在基板的边缘部分的硬掩模膜，以除去形成在该基板上的硬掩模膜 将基板的边缘部分和溶解掩模膜的掩模膜去除溶液供应到掩模膜以去除基板边缘部分处的掩模膜。
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8.发明申请TREATMENT SOLUTION SUPPLY METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM AND TREATMENT SOLUTION SUPPLY APPARATUS 审中-公开处理解决方案供应方法，非终端计算机存储介质和处理解决方案供应设备公开(公告)号：US20130112628A1
公开(公告)日：2013-05-09
申请号：US13662998
申请日：2012-10-29
CPC分类号： G03F7/0022 , G03F7/16 , Y10T137/794
摘要： A treatment solution supply method of the present invention is for supplying a treatment solution from a treatment solution supply source to a treatment solution supply unit supplying the treatment solution to a substrate, wherein a supply pipe connected to the treatment solution supply unit is provided with a filter collecting foreign matter in the treatment solution and not allowing the foreign matter to be released therefrom, and the treatment solution flowing in the supply pipe is caused to pass through the filter in a reciprocation manner at least one time and then supplied to the treatment solution supply unit, so that the foreign matter in the treatment solution can be sufficiently removed and the collected foreign matter never mixes again into the treatment solution.
摘要翻译： 本发明的处理液供给方法是将处理液供给源的处理液供给到将处理液供给到基板的处理液供给单元，其中，与处理液供给单元连接的供给管具备 过滤器在处理液中收集异物并且不允许异物从其中释放，并且使流过供给管的处理溶液至少一次以往复运动方式通过过滤器，然后供给到处理溶液 供给单元，能够充分除去处理溶液中的异物，收集到的异物不再混入处理液。
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公开(公告)号：US20200227286A1
公开(公告)日：2020-07-16
申请号：US16052875
申请日：2018-08-02
IPC分类号： H01L21/67
摘要： Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.
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公开(公告)号：US10120285B2
公开(公告)日：2018-11-06
申请号：US15374081
申请日：2016-12-09
发明人： Kousuke Yoshihara , Hideharu Kyouda , Koshi Muta , Taro Yamamoto , Yasushi Takiguchi , Masahiro Fukuda
摘要： A developing apparatus including a horizontal substrate holder, a rotating mechanism to rotate the substrate holder, a developer nozzle to supply a developer onto a part of the substrate to form a liquid puddle, a moving mechanism to move the developer nozzle in a radial direction of the rotating substrate, a contact part that moves with the developer nozzle and has a surface opposed to the substrate, which is smaller than the surface of the substrate, and a control unit to output a control signal such that a supply position of the developer on the substrate is moved in the radial direction of the substrate so that the liquid puddle is spread out on a whole surface of the substrate while the contact part is in contact with the liquid puddle.
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