Invention Grant
- Patent Title: Extreme ultraviolet capping layer and method of manufacturing and lithography thereof
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Application No.: US14696322Application Date: 2015-04-24
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Publication No.: US09739913B2Publication Date: 2017-08-22
- Inventor: Cara Beasley , Ralf Hofmann , Majeed A. Foad , Rudy Beckstrom, III
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: G02B5/08
- IPC: G02B5/08 ; G02B1/14 ; G03F7/20

Abstract:
A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.
Public/Granted literature
- US20160011344A1 EXTREME ULTRAVIOLET CAPPING LAYER AND METHOD OF MANUFACTURING AND LITHOGRAPHY THEREOF Public/Granted day:2016-01-14
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