- Patent Title: Inspection apparatus and methods, methods of manufacturing devices
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Application No.: US14794013Application Date: 2015-07-08
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Publication No.: US09753379B2Publication Date: 2017-09-05
- Inventor: Amandev Singh , Henricus Petrus Maria Pellemans , Patrick Warnaar
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP14176391 20140709
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/32 ; G03F7/20 ; G01J3/28 ; G01J3/45 ; G01N21/47

Abstract:
Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.
Public/Granted literature
- US20160011523A1 Inspection Apparatus and Methods, Methods of Manufacturing Devices Public/Granted day:2016-01-14
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