Invention Grant
- Patent Title: Radiation source and lithographic apparatus
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Application No.: US14409048Application Date: 2013-06-13
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Publication No.: US09753383B2Publication Date: 2017-09-05
- Inventor: Michel Riepen , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/062259 WO 20130613
- International Announcement: WO2013/189827 WO 20131227
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G21K5/08 ; F15D1/00 ; G21K1/06 ; H05G2/00
Abstract:
A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
Public/Granted literature
- US20150338753A1 Radiation Source and Lithographic Apparatus Public/Granted day:2015-11-26
Information query
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