Invention Grant
- Patent Title: Memory arrays having confined phase change material structures laterally surrounded with silicon nitride
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Application No.: US15279158Application Date: 2016-09-28
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Publication No.: US09755145B2Publication Date: 2017-09-05
- Inventor: Andrea Redaelli , Giorgio Servalli , Carmela Cupeta , Fabio Pellizzer
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
Some embodiments include methods of forming memory cells. Heater structures are formed over an array of electrical nodes, and phase change material is formed across the heater structures. The phase change material is patterned into a plurality of confined structures, with the confined structures being in one-to-one correspondence with the heater structures and being spaced from one another by one or more insulative materials that entirely laterally surround each of the confined structures. Some embodiments include memory arrays having heater structures over an array of electrical nodes. Confined phase change material structures are over the heater structures and in one-to-one correspondence with the heater structures. The confined phase change material structures are spaced from one another by one or more insulative materials that entirely laterally surround each of the confined phase change material structures.
Public/Granted literature
- US20170018708A1 Memory Cells, Memory Arrays, and Methods of Forming Memory Cells and Arrays Public/Granted day:2017-01-19
Information query
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