Invention Grant
- Patent Title: Illumination system and method of forming fin structure using the same
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Application No.: US14714357Application Date: 2015-05-18
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Publication No.: US09772557B2Publication Date: 2017-09-26
- Inventor: En-Chiuan Liou , Yu-Cheng Tung
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: CN201510160096 20150407
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An illumination system includes a light source used to generate a light and an opaque plate. The opaque plate is disposed between the light source and a photomask and includes an annular aperture and an aperture dipole. The annular aperture has an inner side and an outer side. The aperture dipole includes at least one first aperture and at least one second aperture. The first aperture and the second aperture connected to the annular aperture respectively and protruding out from the outer side of the annular aperture are disposed symmetrically with respect to a center of the annular aperture.
Public/Granted literature
- US20160299433A1 ILLUMINATION SYSTEM AND METHOD OF FORMING FIN STRUCTURE USING THE SAME Public/Granted day:2016-10-13
Information query
IPC分类: