Invention Grant
- Patent Title: Substrate processing apparatus, substrate processing system, and method of detecting abnormality in transport container
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Application No.: US14649673Application Date: 2013-12-10
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Publication No.: US09773690B2Publication Date: 2017-09-26
- Inventor: Katsuhiro Morikawa , Ikuo Sunaka , Suguru Enokida
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-Ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-Ku
- Agency: Burr & Brown, PLLC
- Priority: JP2012-269601 20121210
- International Application: PCT/JP2013/083066 WO 20131210
- International Announcement: WO2014/092074 WO 20140619
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67

Abstract:
A substrate processing apparatus includes: a load port into and out of which the transport container is carried; and an apparatus controller that controls operations in the load port. The apparatus controller includes a storage unit that stores transition data of parameter values sent from outside based on a transport container identification code. The transition data of the parameter values each comprises a usage count of the transport container and a corresponding parameter value that quantifies a result of at least one of an operation performed to remove the lid after the transport container is carried into the load port and an operation performed to carry the container out of the load port. The apparatus controller further includes a determination unit that determines, after a transport container is carried into the load port, presence or absence of an abnormality in that transport container based on a parameter value associated with at least one of carrying-in or carrying-out of that transport container, and past transition data of parameter values associated with that transport container.
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Information query
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