Invention Grant
- Patent Title: Conductive polymer composition, coated article, patterning process and substrate
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Application No.: US14979781Application Date: 2015-12-28
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Publication No.: US09778570B2Publication Date: 2017-10-03
- Inventor: Takayuki Nagasawa , Jun Hatakeyama
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2015-17233 20150130; JP2015-169308 20150828
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F220/24 ; G03F7/09 ; C07C227/06 ; G03F7/039 ; G03F7/11 ; C07C227/08 ; C07C227/12 ; C09D11/52 ; G03C1/89 ; G03F7/20 ; G03F7/32 ; H01B1/12 ; C08G73/02 ; C09D179/02

Abstract:
The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) a betaine compound, wherein RA1 to RA4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and RA1 and RA2, or RA3 and RA4 may be bonded to each other to form a ring. There can be provided a conductive polymer composition that has excellent antistatic performance and applicability, does not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.
Public/Granted literature
- US20160223909A1 CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, PATTERNING PROCESS AND SUBSTRATE Public/Granted day:2016-08-04
Information query
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