Invention Grant
- Patent Title: Processing liquid supplying apparatus, processing liquid supplying method and storage medium
-
Application No.: US14548719Application Date: 2014-11-20
-
Publication No.: US09778571B2Publication Date: 2017-10-03
- Inventor: Takashi Sasa , Daisuke Ishimaru
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-Ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-Ku
- Agency: Burr & Brown, PLLC
- Priority: JP2013-240063 20131120
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G03F7/16 ; G03F7/30

Abstract:
A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.
Public/Granted literature
- US20150140485A1 PROCESSING LIQUID SUPPLYING APPARATUS, PROCESSING LIQUID SUPPLYING METHOD AND STORAGE MEDIUM Public/Granted day:2015-05-21
Information query
IPC分类: