发明授权
- 专利标题: Defect inspecting method, sorting method and producing method for photomask blank
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申请号: US15256111申请日: 2016-09-02
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公开(公告)号: US09829442B2公开(公告)日: 2017-11-28
- 发明人: Tsuneo Terasawa , Atsushi Yokohata , Daisuke Iwai , Takahiro Kishita , Hiroshi Fukuda
- 申请人: Shin-Etsu Chemical Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2015-174684 20150904
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N21/88 ; G01N21/956 ; G03F1/84
摘要:
Disclosed is a method of inspecting a defect present at a surface portion of a photomask blank which includes an optical film, and a thin film. The method includes: selecting and designating an inspection treatment procedure and a criterion for determination of rugged shape of the defect which correspond to modes of the optical film and the thin film of the photomask blank; applying inspection light to a region including the defect while maintaining a distance between the defect and an objective lens of an inspecting optical system, based on the designated inspection treatment procedure, and collecting reflected light from the region irradiated with the inspection light, as a magnified image of the region, through the inspecting optical system; and determining the rugged shape of the defect, from light intensity distribution of the magnified image, based on the designated criterion for determination.