- 专利标题: Method of fabricating a three-dimensional semiconductor memory device having a plurality of memory blocks on a peripheral logic structure
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申请号: US15348009申请日: 2016-11-10
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公开(公告)号: US09837429B2公开(公告)日: 2017-12-05
- 发明人: Yunghwan Son , Jaesung Sim , Shinhwan Kang , Youngwoo Park , Jaeduk Lee
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-si, Gyeonggi-Do
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-Do
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR10-2014-0146296 20141027
- 主分类号: H01L27/11575
- IPC分类号: H01L27/11575 ; H01L27/11582 ; H01L27/11573 ; G11C16/30 ; H01L29/34 ; H01L27/11526 ; G11C5/02 ; G11C16/04 ; H01L27/11517 ; H01L27/11565 ; H01L27/1157 ; H01L27/11548 ; H01L27/11556 ; H01L27/11551
摘要:
A three-dimensional (3D) semiconductor memory device that includes a peripheral logic structure including peripheral logic circuits disposed on a semiconductor substrate and a first insulation layer overlapping the peripheral logic circuits, and a plurality of memory blocks spaced apart from each other on the peripheral logic structure. At least one of the memory blocks includes a well plate electrode, a semiconductor layer in contact with a first surface of the well plate electrode, a stack structure including a plurality of electrodes vertically stacked on the semiconductor layer, and a plurality of vertical structures penetrating the stack structure and connected to the semiconductor layer.
公开/授权文献
- US20170062453A1 THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE 公开/授权日:2017-03-02
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