- 专利标题: Method for pretreating substrates for PVD methods
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申请号: US14075085申请日: 2013-11-08
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公开(公告)号: US09845527B2公开(公告)日: 2017-12-19
- 发明人: Helmut Rudigier , Jürgen Ramm , Beno Widrig , Troy Vom Braucke
- 申请人: Oerlikon Trading AG, Trübbach
- 申请人地址: CH Pfäffikon
- 专利权人: Oerlikon Surface Solutions AG, Pfäffikon
- 当前专利权人: Oerlikon Surface Solutions AG, Pfäffikon
- 当前专利权人地址: CH Pfäffikon
- 优先权: EP09004581 20090330
- 主分类号: C23C14/00
- IPC分类号: C23C14/00 ; C23C14/32 ; C23C14/02 ; H01J37/32
摘要:
The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.
公开/授权文献
- US20140061034A1 METHOD FOR PRETREATING SUBSTRATES FOR PVD METHODS 公开/授权日:2014-03-06
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