公开(公告)号：US09845527B2

公开(公告)日：2017-12-19

申请号：US14075085

申请日：2013-11-08

申请人： Oerlikon Trading AG, Trübbach

发明人： Helmut Rudigier ,  Jürgen Ramm ,  Beno Widrig ,  Troy Vom Braucke

IPC分类号： C23C14/00 ,  C23C14/32 ,  C23C14/02 ,  H01J37/32

CPC分类号： C23C14/325 ,  C23C14/022 ,  C23C14/025 ,  H01J37/32055 ,  H01J37/32064

摘要： The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

公开(公告)号：US20140061034A1

公开(公告)日：2014-03-06

申请号：US14075085

申请日：2013-11-08

申请人： Oerlikon Trading AG, Trübbach

发明人： Helmut Rudigier ,  Jürgen Ramm ,  Beno Widrig ,  Troy Vom Braucke

IPC分类号： C23C14/32

CPC分类号： C23C14/325 ,  C23C14/022 ,  C23C14/025 ,  H01J37/32055 ,  H01J37/32064

摘要： The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

摘要翻译： 本发明涉及一种用于在真空处理系统中涂覆工件的方法，该真空处理系统具有作为电弧蒸发源的一部分的实施为目标的第一电极。 使用第一电极，电弧以电弧电流运行并蒸发材料。 偏置电压与工件一起施加到偏置电极，偏置电极包括实施为工件保持器的第二电极。 进行金属离子轰击以预处理工件或在多层体系的一层到相邻层的至少一个过渡中，使得不会发生显着的材料去除和显着的材料堆积，而是引入金属离子 进入基板表面或成为多层系统的层。