Invention Grant
- Patent Title: Photoresist composition and method of manufacturing substrate for display device by using the same
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Application No.: US14801111Application Date: 2015-07-16
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Publication No.: US09851635B2Publication Date: 2017-12-26
- Inventor: Chadong Kim , Hoon Kang , Wooyong Sung , Hikuk Lee , Changhoon Kim , Jungin Park , Sanghyun Yun , Kibeom Lee , Jaehyuk Chang , Deokman Kang , Younsuk Kim , Saetae Oh
- Applicant: SAMSUNG DISPLAY CO., LTD. , AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL
- Applicant Address: KR Yongin, Gyeonggi-Do LU Luxembourg
- Assignee: SAMSUNG DISPLAY CO., LTD.,AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL
- Current Assignee: SAMSUNG DISPLAY CO., LTD.,AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL
- Current Assignee Address: KR Yongin, Gyeonggi-Do LU Luxembourg
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2014-0089800 20140716
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/40 ; G03F7/038 ; C07D213/02 ; G03F7/00 ; H01L21/00
Abstract:
A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, in which L11 is selected from a single bond, a C1-C10 alkylene group, a C2-C10 alkenylene group, and a C2-C10 alkynylene group; and R11 is selected from a C6-C15 aryl group, or a C6-C15 aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C1-C10 alkyl group, a C1-C10 alkoxy group, and a C6-C15 aryl group.
Public/Granted literature
- US20160018731A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY DEVICE BY USING THE SAME Public/Granted day:2016-01-21
Information query
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