专利检索 ap:("SAMSUNG DISPLAY CO., LTD." OR "AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL") AND inv:"Saetae Oh" 第 1 页

1.

发明授权
Photoresist composition and method of manufacturing substrate for display device by using the same 有权

公开(公告)号：US09851635B2

公开(公告)日：2017-12-26

申请号：US14801111

申请日：2015-07-16

申请人： SAMSUNG DISPLAY CO., LTD. , AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL

发明人： Chadong Kim , Hoon Kang , Wooyong Sung , Hikuk Lee , Changhoon Kim , Jungin Park , Sanghyun Yun , Kibeom Lee , Jaehyuk Chang , Deokman Kang , Younsuk Kim , Saetae Oh

IPC分类号： G03F7/004 , G03F7/20 , G03F7/40 , G03F7/038 , C07D213/02 , G03F7/00 , H01L21/00

CPC分类号： G03F7/004 , C07D213/02 , G03F7/0007 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/0384 , G03F7/20 , G03F7/2057 , G03F7/40 , H01L21/00

摘要： A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, in which L11 is selected from a single bond, a C1-C10 alkylene group, a C2-C10 alkenylene group, and a C2-C10 alkynylene group; and R11 is selected from a C6-C15 aryl group, or a C6-C15 aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C1-C10 alkyl group, a C1-C10 alkoxy group, and a C6-C15 aryl group.