- 专利标题: Underfill dispensing in 3D IC using metrology
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申请号: US14997049申请日: 2016-01-15
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公开(公告)号: US09859181B2公开(公告)日: 2018-01-02
- 发明人: Jing-Cheng Lin , Szu-Wei Lu , I-Hsuan Peng
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L21/56
- IPC分类号: H01L21/56 ; H01L23/31 ; H01L23/00 ; H01L23/498 ; H01L23/538 ; H01L23/18 ; H01L25/065 ; H01L25/00
摘要:
In some embodiments, a semiconductor device includes a first die, a second die coupled to a first surface of the first die, and a third die coupled to the first surface of the first die. The semiconductor device further includes an underfill material disposed between the first die and the second die and between the first die and the third die. A first volume of the underfill material for the second die is different than a second volume of the underfill material for the third die.
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