Invention Grant
- Patent Title: Semiconductor device structure and method for forming the same
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Application No.: US14933619Application Date: 2015-11-05
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Publication No.: US09881884B2Publication Date: 2018-01-30
- Inventor: Ming-Hsien Yang , Ching-Chun Wang , Dun-Nian Yaung , Feng-Chi Hung , Sin-Yao Huang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L23/532 ; H01L23/00 ; H01L23/522 ; H01L23/48 ; H01L21/768 ; H01L27/146

Abstract:
A semiconductor device structure is provided. The semiconductor device structure includes a first semiconductor substrate having a first surface, a second surface, and a recess. The second surface is opposite to the first surface. The recess passes through the first semiconductor substrate. The semiconductor device structure includes a first wiring layer over the second surface. The semiconductor device structure includes a first bonding pad in the recess and extending to the first wiring layer so as to be electrically connected to the first wiring layer. The semiconductor device structure includes a nickel layer over the first bonding pad. The semiconductor device structure includes a gold layer over the nickel layer.
Public/Granted literature
- US20170047301A1 SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME Public/Granted day:2017-02-16
Information query
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