Invention Grant
- Patent Title: Metal-insulator-metal diodes and methods of fabrication
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Application No.: US14908899Application Date: 2013-07-31
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Publication No.: US09887271B2Publication Date: 2018-02-06
- Inventor: Aya Seike
- Applicant: Empire Technology Development LLC
- Applicant Address: US DE Wilmington
- Assignee: EMPIRE TECHNOLOGY DEVELOPMENT LLC
- Current Assignee: EMPIRE TECHNOLOGY DEVELOPMENT LLC
- Current Assignee Address: US DE Wilmington
- Agency: Dorsey & Whitney LLP
- International Application: PCT/US2013/052868 WO 20130731
- International Announcement: WO2015/016861 WO 20150205
- Main IPC: H01L29/66
- IPC: H01L29/66 ; C23C14/24 ; H01L45/00 ; C23C14/54 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; H01L21/67 ; H01L29/861

Abstract:
Provided herein are embodiments relating to metal-insulator-metal diodes and their method of manufacture. In some embodiments, the metal-insulator-metal diodes can be made, in part, via the use of an evanescent wave on a photo resist. In some embodiments, this allows for finer manipulation of the photo resist and allows for the separation of one piece of metal into a first and second piece of metal. The first piece of metal can then be differentially treated from the second (for example, by annealing another metal to the first piece), to allow for a difference in the work function of the two pieces of metal.
Public/Granted literature
- US20160172463A1 METAL-INSULATOR-METAL DIODES AND METHODS OF FABRICATION Public/Granted day:2016-06-16
Information query
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