Invention Grant
- Patent Title: Electromagnetic cloaking structure and method for manufacturing the same
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Application No.: US15452969Application Date: 2017-03-08
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Publication No.: US09897692B2Publication Date: 2018-02-20
- Inventor: Akihiko Ohtsu , Hideki Yasuda
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-192386 20140922
- Main IPC: G01S7/495
- IPC: G01S7/495 ; G01S7/38 ; G02B1/00 ; F41H3/00

Abstract:
In an electromagnetic cloaking structure, a refractive index distribution has a high refractive index region which is provided around a shielding space and has a maximum value in a plane surrounding the shielding space and in which a refractive index decreases gradually from the centroid of the shielding space along a radial line passing through the plane so as to be close to an average refractive index and a low refractive index region which has a minimum value at two points having the shielding space and the high refractive index region interposed therebetween on a virtual optical axis passing through the shielding space and in which the refractive index increases gradually from the two points in a direction opposite to the high refractive index region on the virtual optical axes, on which the two points are placed, so as to be close to the average refractive index.
Public/Granted literature
- US20170176580A1 ELECTROMAGNETIC CLOAKING STRUCTURE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-06-22
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