Invention Grant
- Patent Title: Method of forming pattern and developer for use in the method
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Application No.: US15235675Application Date: 2016-08-12
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Publication No.: US09897922B2Publication Date: 2018-02-20
- Inventor: Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Kaoru Iwato , Keita Kato , Kana Fujii
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Minato-Ku, Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Minato-Ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-150180 20100630; JP2011-135554 20110617
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/038 ; G03F7/039 ; G03F7/42 ; G03F7/004 ; G03F7/20
Abstract:
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
Public/Granted literature
- US20160349620A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD Public/Granted day:2016-12-01
Information query
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