- 专利标题： Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
-
申请号： US14982759申请日： 2015-12-29
-
公开(公告)号： US09904167B2公开(公告)日： 2018-02-27
- 发明人: Tomotaka Tsuchimura
- 申请人： FUJIFILM Corporation
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2013-145015 20130710; JP2014-026904 20140214
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; H01L21/027 ; C07D327/08 ; C07C309/15 ; C07D333/76 ; C07C311/16 ; C07C327/24 ; C07C381/12 ; C07D209/48 ; C07D333/46 ; C07D335/16 ; C07D339/08 ; C07C311/14 ; C07D347/00 ; C07C311/48 ; C07C311/51 ; C07C327/22 ; C07C327/26 ; C07D493/08 ; C07C25/18 ; C07J31/00 ; C07J41/00 ; C07C309/19 ; C07C321/28 ; C07C323/09 ; C07C323/20 ; H01L29/16 ; G03F7/038 ; G03F7/039
摘要：
Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y1 and Y2 represents a monovalent organic group; each of M1+ and M2+ represents an organic onium ion; each of X1 and X2 represents a group that is represented by —S—, —NH—, or —NR1—; R1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R1 and Y1 or Y2 may bond with each other to form a ring.
信息查询
IPC分类:
